Posted in | Thickness Measurement

Sheet Resistance Mapping with the R54

Filmetrics R-Series resistivity mapping tools combine KLA’s 45-year-old sheet resistance technology with benchtop instrument technology and a user interface honed over the previous 20 years by the Filmetrics team.

The 4PP contact four-point probe configuration is ideal for thin metal and ion implant layers, whereas the non-contact Eddy Current (EC) probe is preferred for thicker metal layers and soft or flexible conductive surfaces. These approaches enable a wide variety of measurements, including but not limited to the following:

  • Thin film thickness or resistivity
  • Sheet conductivity
  • Bulk conductivity
  • Metal film and backside layer thickness measurements
  • Substrate resistivity
  • Sheet resistance

Using rectangular, linear, polar, and custom configurations, the Filmetrics R50 resistivity mapping system is designed to accommodate a wide variety of sample types with enhanced clearance and automated sample point mapping.

The R50 measurement performance is available in a light-tight enclosure with the KLA Instruments R54-Series systems, which also have the capacity to support automated X-Y-θ stages for full 200 mm or 300 mm wafer mapping of semiconductor and compound semiconductor wafers.

Models

Source: KLA Instruments™

Model Sensor Type Measurement
Range
Maximum
Map
Diameter
XY Stage
Range
Maximum
Sample
Height
R50-4PP Contact 4PP 1 mΩ/sq -
200 MΩ/sq
100 mm 100 mm x
100 mm
100 mm
R50-EC Non-contact
eddy current
1 mΩ/sq -
50 Ω/sq
100 mm 100 mm x
100 mm
100 mm
R50-200-4PP Contact 4PP 1 mΩ/sq -
200 MΩ/sq
200 mm 200 mm
round
100 mm
R50-200-EC Non-contact
eddy current
1 mΩ/sq -
50 Ω/sq
200 mm 200 mm
round
100 mm
R54-200-4PP Contact 4PP 1 mΩ/sq -
200 MΩ/sq
200 mm 200 mm x
200 mm
15 mm
R54-200-EC Non-contact
eddy current
1 mΩ/sq -
50 Ω/sq
200 mm 200 mm x
200 mm
15 mm
R54-300-4PP Contact 4PP 1 mΩ/sq -
200 MΩ/sq
300 mm 300 mm
round*
15 mm
R54-300-EC Non-contact
eddy current
1 mΩ/sq -
50 Ω/sq
300 mm 300 mm
round*
15 mm

*Automated X-Y-θ stages

Common Optional Accessories

4PP-TypeA.

4PP-TypeA. Image Credit: KLA Instruments™

4PP-TypeB.

4PP-TypeB. Image Credit: KLA Instruments™

4PP-TypeC.

4PP-TypeC. Image Credit: KLA Instruments™

CondWafer-4PP.

CondWafer-4PP. Image Credit: KLA Instruments™

Sheet Resistance and Other Measurement Applications

  • Solar Cells
  • Flat panel display layers and patterned features
  • Metal foils
  • Conductive rubbers & elastomers
  • Semiconductor wafer substrates
  • Glass substrates
  • Plastic (flexible) substrates
  • PCB patterned features

Other Equipment by this Supplier

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