Jun 23 2015
CyberOptics® Corporation, a leading global developer and manufacturer of high precision 3D sensing technology solutions, will present at the 31st European Mask and Lithography Conference, EMLC 2015, at The Pullman Hotel 22-23, June 2015 in Eindhoven. The two-day conference focuses on the science, technology, engineering and application of mask and lithography technologies and associated processes.
Allyn Jackson, field application engineer at CyberOptics, will share insights, best practices and technical know-how for quickly identifying and resolving particles in photo lithography environments. Poster Sessions take place on Monday, 22 June 2015, from 17:30 – 18:40 at the Winteruin Hall in the Technical Exhibition.
“Minimizing airborne particles in lithography applications remains a challenge if using traditional surface scan reticles, in-situ or hand-held methods. Legacy methods such as these lack real-time feedback, and often unexpected particle sources go undetected for hours or even days before finally identified,” said Jackson. “CyberOptics will review the advantages of using the wireless reticle-like particle counter method as a more efficient and effective means of quickly identifying, locating and troubleshooting airborne particles in real-time.”
CyberOptics ReticleSense® Airborne Particle Sensor Quartz (APSRQ) was designed and developed for use with scanners and steppers in semiconductor fabs and has all of the necessary alignment marks and bar codes for broad compatibility. The APSRQ can be loaded directly into a scanner just like a quartz reticle, and travel the entire reticle path to detect in real-time when and where particles occur.
Lithography engineers can rely on CyberOptics ReticleSense proprietary technology, which is an extension of the proven WaferSense® wafer-shaped Airborne Particle Sensor (APS) device in use at semiconductor fabs worldwide including the three largest manufacturers where a contamination-free environment is critical.
WaferSense and ReticleSense Airborne Particle Sensors enable equipment engineers to shorten equipment qualification, release to production and maintenance cycles, all while reducing expenses. Customers have experienced up to 88% time savings, up to 95% reduction in costs, and up to 20X the through-put with half the manpower resource requirements using the WaferSense or ReticleSense sensors relative to legacy surface scan wafer methods.
About the WaferSense and ReticleSense Line
The WaferSense measurement portfolio including the Auto Leveling System (ALS), the Auto Gapping System (AGS), the Auto Vibration System (AVS), the Auto Teaching System (ATS) and the Airborne Particle Sensor (APS) are available now in 200mm, 300mm and 450mm wafer sizes. Additionally, both APS and ALS are available in 150mm sizes. The ReticleSense Airborne Particle Sensor (APSR), the ReticleSense Auto Leveling System (ALSR) and the new ReticleSense Airborne Particle Sensor Quartz (APSRQ) are available in a reticle shaped form factor.
For more information about the entire line of CyberOptics solutions please visit the company’s website at www.cyberoptics.com.
Source: http://www.cyberoptics.com/