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NikkoIA to Manufacture Near IR Image Sensors Using Siemens Photodetector Technology

NikkoIA, a start up based out of Grenoble, has inked an exclusive global license agreement with Seimens. The contract will allow NikkoIA to use Seimens’ photodetector technology for manufacturing near infrared image sensors.

Formed in May 2011, NikkoIA’s objective is to design and produce multispectral image sensors and photodetectors in the visible and near infrared regions (0.7 – 3µm) of the spectrum. It banks on an advanced technology from Siemens Corporate Technology, which combines organic and inorganic materials that are sensitive to certain wavelengths Thin films of these materials are deposited on electronic substrates, which results in small-sized, high-performance and cost-effective sensors.

Some of the major advantages of the technology are shape, resolution, sensitivity and a simple manufacturing method. The process is compatible with CMOS and amorphous silicon thin-film transistor backplanes and thus complements state-of-the-art technical developments.

The agreement signed by NikkoIA and Siemens on an extensive patents portfolio will be complete after the transfer of technology and know-how by Siemens to NikkoIA, whose Grenoble unit and future production plants can take advantage of the rich electronics, imaging and semiconductor competencies, and booming infrared industry in Grenoble.

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